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Wednesday, 26 September 2007

Session 4A: Technology & Device Design

  11:00 - 11:20 Impact of Two-Step Recessed SiGe S/D Engineering for Advanced pMOSFETs of 32 nm Technology Node and Beyond  
    N. Kusunoki, N. Yasutake, M. Awano, I. Mizushima, H. Yoshimura, S. Yamada, F. Matsuoka  
  11:20 - 11:40 Simulation Study of Multiple FIN FinFET Design for 32nm Technology Node and Beyond  
    X. Wang, A. Bryant, O. Dokumaci, P. Oldiges, W. Haensch  
  11:40 - 12:00 Device Design and Scalability of an Impact-Ionization MOS Transistor
with an Elevated Impact Ionization Region		  
    E.-H. Toh, G. H. Wang, L. Chan, G. Samudra, Y.-C. Yeo  
  12:00 - 12:20 A Prototype Wafer Processing TCAD Tool Composed of BMD Simulation Module, Metal Gettering and Thermal Stress/Slip Functions for Scaled Device Design Phase  
    T. Okada, A. Fathurahman, R. Takeda, H. Banba, H. Kubota, Y. Matsushita, M. Naito, S. Nakamura  
  12:20 - 12:40 Compact Modeling of Phase-Change Memories  
    K. Sonoda, A. Sakai, M. Moniwa, K. Ishikawa, O. Tsuchiya, Y. Inoue  
  12:40 - 13:00 Modeling of NBTI Degradation for SiON pMOSFET  
    J. Shimokawa, T. Enda, N. Aoki, H. Tanimoto, S. Ito, Y. Toyoshima  

Session 4B: First-Principles Methods

  11:00 - 11:20 Modeling Study of Ultra-Thin Ge Layers Using Tight-Binding, LCBB and kp Methods  
    D. Rideau, E. Batail, S. Monfray, C. Tavernier, H. Jaouen  
  11:20 - 11:40 Analysis of Silicon Dioxide Interface Transition Region in MOS Structures  
    S. Markov, N. Barin, C. Fiegna, S. Roy, E. Sangiorgi, A. Asenov  
  11:40 - 12:00 Tunneling Properties of MOS Systems Based on High-k Oxides  
    F. Sacconi, A. Pecchia, J.M.Jancu, M. Povolotskyi, A. Di Carlo, J.M. Jancu  
  12:00 - 12:20 First-Principles Investigation on Oxide Trapping  
    W. Gös, T. Grasser  
  12:20 - 12:40 A Self-Consistent Simulation of InSb Double-Gate MOSFETs Using Full-Band Tight-Binding Approach  
    X. Guan, Y. Tan, J. Lu, L. Tian, Y. Wang, Z. Yu  
  12:40 - 13:00 Influence of Oxygen Composition and Carbon Impurity on Electronic Reliability of HfO2  
    K. Suzuki, Y. Ito, H. Miura